College of Engineering - Chemical Engineering

  • Professor
  • CHAE, HEEYEOP 홈페이지 바로가기

Journal Articles

  • (2023)  Plasma atomic layer etching of ruthenium with surface fluorination and ion bombardment.  PLASMA PROCESSES AND POLYMERS.  21,  2
  • (2023)  Surface wettability control and fluorination modeling of amorphous carbon films fluorinated with CF4 plasma.  APPLIED SURFACE SCIENCE.  635,  1
  • (2023)  Spectral clustering algorithm for real‐time endpoint detection of silicon nitride plasma etching.  PLASMA PROCESSES AND POLYMERS.  20,  6
  • (2023)  Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes.  KOREAN JOURNAL OF CHEMICAL ENGINEERING.  40,  6
  • (2023)  Thermal atomic layer etching of cobalt using plasma chlorination and chelation with hexafluoroacetylacetone.  APPLIED SURFACE SCIENCE.  619,  1
  • (2023)  Control of the Reaction Kinetics of Monodispersed InP/ZnSeS/ZnSBased Quantum Dots Using Organophosphorus Compounds for Electroluminescent Devices.  JOURNAL OF PHYSICAL CHEMISTRY LETTERS.  14,  1
  • (2022)  Low Global Warming C4H3F7O Isomers for Plasma Etching of SiO2 and Si3N4 Films.  ACS SUSTAINABLE CHEMISTRY & ENGINEERING.  10,  32
  • (2022)  Quantitative Analysis of Mass Spectrometric Signals for the Estimation of Fluorine Radical Densities in CF4 and CF4/O-2 Plasmas.  PLASMA CHEMISTRY AND PLASMA PROCESSING.  42,  4
  • (2022)  Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange.  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A.  40,  3
  • (2022)  Plasma atomic layer etching for titanium nitride at low temperatures.  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B.  40,  2
  • (2022)  Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination.  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A.  40,  2
  • (2021)  Characterization of sp(2)/sp(3) hybridization ratios of hydrogenated amorphous carbon films deposited in C2H2 inductively coupled plasmas.  SURFACE & COATINGS TECHNOLOGY.  422,  1
  • (2021)  Etching characteristics of hydrogenated amorphous carbon with different sp(2)/sp(3) hybridization ratios in CF4/O-2 plasmas.  PLASMA PROCESSES AND POLYMERS.  18,  11
  • (2021)  Enhancing the efficiency of solution-processed inverted quantum dot light-emitting diodes via ligand modification with 6-mercaptohexanol.  OPTICS LETTERS.  46,  6
  • (2020)  Efficiency Enhancement of Tris(dimethylamino)-phosphine-Based Red Indium Phosphide Quantum-Dot Light-Emitting Diodes via Chlorine-Doped ZnMgO Electron Transport Layers.  JOURNAL OF PHYSICAL CHEMISTRY C.  124,  46
  • (2020)  Synthesis of Blue-Emissive InP/GaP/ZnS Quantum Dots via Controlling the Reaction Kinetics of Shell Growth and Length of Capping Ligands.  NANOMATERIALS.  10,  11
  • (2020)  Tetrahydrofuran as Solvent for P3HT/F4-TCNQ Hole-Transporting Layer to Increase the Efficiency and Stability of FAPbI3-Based Perovskite Solar Cell.  JOURNAL OF PHYSICAL CHEMISTRY C.  124,  26
  • (2020)  Radical analysis and residence-time effect of silicon nitride atomic layer deposition processes with trisilylamine and NH3 plasmas.  APPLIED PHYSICS EXPRESS.  13,  6
  • (2020)  Flexible Al2O3/plasma polymer multilayer moisture barrier films deposited by a spatial atomic layer deposition process.  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A.  38,  2
  • (2020)  Plasma atomic layer etching of SiO2 and Si3N4 with heptafluoropropyl methyl ether (C3F7OCH3).  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A.  38,  2

Patent/Intellectual Property

  • Light-Emitting Structure, Optical Member Having The Light-Emitting Structure, Light-Emitting Device, and Liquid Crystal Display Apparatus.  16/031,145.  20210126.  UNITED STATES
  • 흡습성 박막을 포함하는 봉지 부재 및 이를 포함하는 유기 전자 장치.  10-2019-0009557.  20200302.  KOREA, REPUBLIC OF
  • 무기나노입자 구조체를 포함하는 조성물, 이를 이용한 광변환 박막 및 이를 이용한 디스플레이 장치.  10-2018-0045409.  20191230.  KOREA, REPUBLIC OF
  • 무기나노입자 구조체를 포함하는 조성물, 이를 이용한 광변환 박막 및 이를 이용한 디스플레이 장치.  10-2018-0045372.  20191226.  KOREA, REPUBLIC OF
  • 플라즈마 공정의 식각 종료점 진단방법.  10-2017-0014025.  20180831.  KOREA, REPUBLIC OF
  • Electroluminescent Diode Having Delayed Fluorescence Quantum Dot.  15/374405.  20180220.  UNITED STATES
  • 무기나노입자 구조체, 이를 포함하는 박막, 광학 부재, 발광 소자 및 양자점디스플레이 장치.  10-2017-0091066.  20180205.  KOREA, REPUBLIC OF
  • 발광 구조체, 이를 포함하는 광학 부재, 발광 소자 및 액정표시장치.  10-2017-0087045.  20180130.  KOREA, REPUBLIC OF
  • 유기발광소자용 봉지막 및 광원 유닛.  10-2016-0130018.  20170922.  KOREA, REPUBLIC OF
  • 전기분무를 이용한 발광소자 제조 방법.  10-2015-0175695.  20170407.  KOREA, REPUBLIC OF
  • 광경화성 수지 조성물, 이를 이용한 휘도 강화 필름 및 이를 포함하는 액정 표시 장치.  10-2015-0166471.  20170306.  KOREA, REPUBLIC OF
  • 형광체 코팅용 고형 복합체 및 이의 제조 방법.  10-2015-0012168.  20161227.  KOREA, REPUBLIC OF
  • 지연형광-양자점 전계발광다이오드.  10-2015-0176095.  20160623.  KOREA, REPUBLIC OF
  • 플라즈마 식각 공정의 식각 종료점 검출방법.  10-2014-0096627.  20160119.  KOREA, REPUBLIC OF
  • 유기전자소자용 폴리머/무기 다층 박막 봉지.  10-2014-0017311.  20150716.  KOREA, REPUBLIC OF
  • 플라즈마 식각 공정의 식각 종료점 진단방법.  10-2015-0002503.  20150624.  KOREA, REPUBLIC OF
  • 플라즈마 식각 공정의 식각 종료점 검출 방법.  10-2014-0073093.  20150611.  KOREA, REPUBLIC OF
  • 초극유연성 봉지 박막.  2014-0015730.  20141119.  KOREA, REPUBLIC OF
  • 패턴 형성 장치.  2013-0024781.  20140819.  KOREA, REPUBLIC OF
  • 패턴 형성 장치.  2012-0092448.  20140423.  KOREA, REPUBLIC OF